þÿ<!DOCTYPE HTML PUBLIC "-//W3C//DTD HTML 4.01 Transitional//EN" "http://www.w3.org/TR/html4/loose.dtd"> <html> <head> <title>Laboratory of Surface Analysis - ESCA</title> <meta name="GENERATOR" content="Quanta Plus"> <meta http-equiv="Content-Type" content="text/html; charset=iso-8859-2"> <link rel="stylesheet" type="text/css" href="http://www.vscht.cz/clab/clab.css"> </head> <body style=" margin: 0px; padding: 10px 20% 5px 10%"> <div id="strom"> <a href="http://www.vscht.cz" name="Vysoká kola chemicko-technologická" target="_top">ICT Prague</a> > <a href="http://www.vscht.cz/clab/english/english.htm" name="Central Laboratories" target="_top">Central Laboratories</a> > Laboratory of Surface Analysis </div> <h2>Laboratory of Surface Analysis - ESCA</h2><br> (XPS X-ray photoelectron spectroscopy, ESCA Electron Spectroscopy for Chemical Analysis)<br> <p><p><p align="justify"> The ESCA Probe P made by Omicron Nanotechnology in 2004 is available for all types of measurements which are presented in following text. The instrument is equipped with monochromator, two types of ion guns, electron detection system with 5 chaneltrons, with source of low energy electrons for charge compensation, source of ultraviolet ray for UPS (ultraviolet photoelectron spectroscopy) for analyses of valence electrons, with detector of secondary electrons and with source of electrons for Auger spectroscopy. </p> <img src="http://www.vscht.cz/clab/esca.jpg" width="331" height="350" align="right" border="0" > <h3>Configuration of instrument</h3> <p><p><p align="justify"> ESCA Probe P consists of analysis chamber, preparation chamber, entry chamber combined with exposition chamber, which is designed for high temperature and high pressure exposition of measured samples. Ion gun and evaporator are connected to preparation chamber, more sophisticated ion gun is connected to analyses chamber. Hemispherical detector with 5 chaneltrons, monochromated source of X-ray, detector of secondary electrons, focused electron source for Auger analyses, low energy electron source for compensation and LEED (low energy electron diffraction) and dual x-ray source are available for measurement on analyses chamber. </p> <p><p><p align="justify"> <b>Experimental conditions:</b> Analysis is carried out under UHV condition (UHV Ultra High Vaccum - aprox. 10E-10 mbar). It is possible to measure under elevated temperature (up to 400°C), and under low temperature (near temperature of liquid nitrogen). </p> <p> <b>Area analyzed by XPS:</b> The analysed area depends on the setting of instrument and extends from diameter approx. 70 &mu;m to diameter 1.3 mm.</p> <h3>Available techniques</h3> <p> <b>XPS</b> - X-ray Photoelectron Spectroscopy<br> <b>UPS</b> - Ultraviolet Photoelectron Spectroscopy<br> <b>SEM</b> - Scanning Electron Microscopy with low lateral resolution (1 &mu;m)<br> <b>SAM</b> - Scanning Auger Microscopy  available mapping of elementary composition of surface with the same lateral resolution as SEM<br> <b>LEED</b> - Low energy electron diffraction<br> <br> </p> <h3>Most frequent analyses</h3> <ul> <li>Oxidation levels of catalysers</li> <li>Surface of organic materials (mainly after some processing) and monitoring of surface changes</li> <li>Corrosion</li> <li>Layers for chemical sensors</li> <li>Materials for electronics with measurement of concentration profiles</li> </ul> <h3>Samples requirements</h3> <p> Samples must be compatible with UHV, it means mainly that they must not release any gas for long time. Samples can be powders, tablets, plates, etc. Diameter of the sample holder is 25.4 mm and the height of the sample should be lower then 5 mm. </p> <h3>Contact</h3> <p> RNDr.(MSc) Petr Sajdl, CSc.(PhD)<br> head<br> phone: +420 22044 3078; +420 22044 3073<br> e-mail: petr.sajdl@vscht.cz <br> <br> Ing.(MSc) Marie Kudrnová<br> phone: +420 22044 3078; +420 22044 3073<br> e-mail: hubickom@vscht.cz <br> </p> </body> </html>